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11. Chemically Robust Ambipolar Organic Transistor Array Directly Patterned by Photolithography

관리자 │ 2020-10-06

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E. K. Lee,† C. H. Park,† J. Lee, H. R. Lee, C. Yang,* J. H. Oh,* "Chemically Robust Ambipolar Organic Transistor Array Directly Patterned by Photolithography", Adv. Mater. 2017, 29 (11), 1605282.  [† Contributed equally]

[Selected as a Back Cover Paper]

A photolithography patterning process for the polymer semiconductor layer is demonstrated by Changduk Yang, Joon Hak Oh, and co-workers in article number 1605282 for the fabrication of organic field-effect transistors (OFETs) on a flexible plastic substrate. The chemically robust OFETs developed exhibit high insolubility in organic solvents, and thus ambipolar OFET arrays, with well-balanced charged transport as a consequence of the graphene electrodes, can be successfully patterned by a conventional photolithography process.




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